镀层的性质:一般厚度大约2.0-3.0 μm;摩擦系数小于 0.15。(典型为:0.05-0.10间)(against WC/Co ball);硬度Hp > 1,200kg/mm2 ;深灰黑色;划痕粘接力:大于60N;相对磨损率:2E-16 m3/Nm (WC-6%Co ball Ø5mm, 80 N test Ø8mm track, 477rpm, 200mms-1)。
· MoS2基镀层一般厚度大于1.0 μm;摩擦系数约为0.05 到 0.10之间(against WC/Co ball);在150kgf的洛氏硬度计压头压入,镀层不脱落(>HF2),硬度约 950-1050 VHN;深灰色;划痕粘接力:大于60N;相对磨损率:2E-16 m3/Nm (WC-6%Co ball Ø5mm, 40 N test Ø8mm track, 477rpm, 200mms-1)。
· •MoST : Properties of coating
CrN 镀层
CrN: 镀层硬度Hf>2000HV,镀层厚度>3微米;结合力:在150kgf的洛氏硬度计压头压入,镀层不脱落(>HF2); 标准划痕试验:Lc>60N;镀层前后的表面粗糙度增加值Ra≤0.01微米,镜面效果。
CrN coating, the hardness of the coating: Hf>2000Hv, the thickness of the coatings: >3.0um. The adhesion of the coatings: >HF2. And Lc > 60N with Scratch system. The Roughness of the coating Ra<0.01
性能优势
· Coating deposition carried out using a high density of low energy bombarding ions.
使用高密度低能量轰击离子进行沉积镀膜。
· Deposition of very dense, non-columnar coating structures with low internal stresses.
镀层致密度好,低柱状晶结构,内应力低
· Deposition of coatings with dense structures at low temperatures.
• 可在低温环境下沉积致密结构的镀层
· High efficiency of ion cleaning resulting in coatings with the highest levels of adhesion.
高效率等离子清理以提供高的镀层结合强度。
· Coatings quality is assured by the use of specially designed Plasmag sputter sources, which create an intense plasma and high ion bombardment of work pieces.
镀层品质保证是由使用专门设计plasmag溅射源及提供高密度的等离子。
离子溅射二硫化钼,真空镀二硫化钼,PVD二硫化钼,离子束溅射MoS2,耐高温:350度,